尔必达推30nm工艺最小尺寸低功耗DDR3颗粒-快科技-科技改变生活

尔必达推30nm工艺最小尺寸低功耗DDR3颗粒

Skyangeles
2010年09月29日 13:39
0

日本尔必达公司今天宣布，已经成功开发出一款采用30nm工艺的2Gb容量DDR3 SDRAM内存颗粒，核心面积和功耗都创下业界新纪录。

该内存颗粒使用30nm工艺制造，是目前全球尺寸最小的2Gb容量DDR3颗粒，每块晶圆的成品产出量可比40nm工艺产品提升45%，大大提升成本竞争力。

该颗粒最高支持DDR3-1866频率，也可以在1.35V低电压下实现1600MHz频率。同时，其工作电流亦为业内最低，相比同厂40nm产品工作电流降低15%，待机电流下降10%。

尔必达将从今年12月开始量产这款30nm工艺2Gb DDR3颗粒，未来还会将30nm工艺引入Mobile RAM等产品线，并加入TSV硅晶穿孔技术，为手机数码相机等产品提供单芯片存储方案。

尔必达开发全球最小30nm低功耗DDR3内存颗粒

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